A. Film diffusion
B. Diffusion through ash layer
C. Chemical reaction
D. Either A., B. or C.
A. Film diffusion
B. Diffusion through ash layer
C. Chemical reaction
D. Either A., B. or C.
A. 8
B. 12
C. 16
D. 32
A. Ash resistance
B. Gas film and pore surface diffusion resistances for reactants
C. Surface phenomenon resistance
D. Gas film and pore surface diffusion resistances for products
A. Always irreversible
B. Insensitive to temperature changes
C. Mostly irreversible
D. Highly temperature sensitive
A. 4
B. 8
C. 12
D. 16
A. Uniformity of temperature
B. Comparatively smaller equipment
C. Very small pressure drop
D. Absence of continuous catalyst regeneration facility
A. Decreases with increase in temperature
B. Increases with increase of pressure of reactants for all reactions
C. Decreases with increase of reactant concentration
D. None of these
A. Converts N2 and H2 into NH3
B. Converts CO to CO2 with steam
C. Is non-catalytic
D. Is highly exothermic
A. 1/(1 + k2 . CA0 . t)
B. (k2 . CA0 . t)/ (1 + k2 . CA0 . t)
C. (k2 . CA0 . t)2/ (1 + k2 . CA0 . t)
D. (k2 . CA0 . t)/ (1 + k2 . CA0 . t)2
2A + B → A2B, ( – rA) = k.CA.CB
A. A + B ⇌ AB; AB + A → A2B
B. A + B → AB; AB + A → A2B
C. A + A → AA; AA + B → A2B
D. A + A ⇌ AA; AA + B → A2B